Interfaces, Confinement, Matériaux et Nanostructures - ICMN

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Jeudi 9 Mars 2017

14h - bibliothèque de l’ICMN

Nanostructured thin films from block copolymer self-assembly : exquisite symmetries from macromolecular design.

Guillaume Fleury - Laboratoire de Chimie des Polymères Organiques (UMR 5629)

Block copolymers are a unique class of materials which self-assemble into periodic structures at the nanometer scale with a range of controllable morphologies, including lamellae, cylinders, spheres and unique network morphologies. Their self-assembly into nanostructured thin films offers a promising route to provide a significant advancement in technological applications such as lithography, non-linear optics or ultrafiltration. Over the last years we have developed a first generation of lithographic materials based on the directed self-assembly of PMMA-b-PS and highlights on the use of Grazing Small X-ray Scattering (GISAXS) to probe their self-assembly kinetics and the resulting mesostructures will be presented. Following this study, we have designed new block copolymer systems characterized by higher segregation strengths and more complex architectures which allow the definition of sub-20 nm features with exquisite symmetries. A few anecdotes related to their thin film self-assembly and their segregation behavior as regards to the processing parameters will be presented. Additionally data obtained by in-situ GISAXS measurements during spin-coating will be discussed in order to further understand the segregation process of block copolymers in thin film configuration.